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4" Wafer Metallization Appearance

4" Wafer Metallization Appearance

Backside Grinding
Si Wafer Thinning down to 50um
GaN on Si Thinning down to 75um
SiC Thinning down to 150 um
TTV ≤ 10um

Backside Metallization
Support Multi-layer Deposition:Ti, Ni, Ag, Sn, Cu, Al
Metal Thickness up to 35um
Uniformity: ±10%
DETAIL

Product Introduction

The Micro Metal Electronics (MMEC) team is familiar with the integration and analysis of front, middle, and back-end processes, including front-end wafer foundries, wafer thinning plants, and back-end packaging factories, enabling them to assist clients in rapid development, problem-solving, and stable mass production, providing comprehensive and reliable semiconductor wafer services.

Services & Specifications

Product / Service Description
Wafer Size 4"、5"、6"、8"、12"
Backside Grinding Si Wafer Thinning down to 50µm
GaN on Si Thinning down to 75µm
SiC Thinning down to 150µm
TTV ≤ 10µm
Backside Metallization Support Multi-layer Deposition: Ti, Ni, Ag, Sn, Cu, Al
Metal Thickness up to 35µm
Uniformity: ±10%

MMEC Competitive Advantage

  • High-spec production equipment – equipped with fully automatic grinding machines and vacuum coating machines, ensuring stable high yield.
  • Experienced technical team – over 18 years of grinding and metallization technology, with accumulative production of over 4 million wafers.
  • Quick delivery and flexible production – small batch samples, rapid trial production, and stable high-quality mass production.
  • Strict quality control – in compliance with ISO 9001 and IATF 16949 international certifications.

Micro Metal Electronics (MMEC) continuously enhances its process technology and yield, providing flexible customized services according to customer needs, assisting the industry in achieving high efficiency, high quality, and stable mass production goals, and becoming a trusted partner in the semiconductor industry.